M03300 - SEMI M33 - Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total Reflection X-Ray Fluorescence Spectroscopy (TXRF) StdTpc-Substrate Carriers and Pods SEMI E10-92 (technical revision)

SEMI E10-92 (technical revision)

• To provide data quality reporting compliance methods

The International System of Units (SI) is used as the standard unit of measure in this Document

범위(Scope) — GEM 표준의 범위는 통신 연결 측면에서 반도체 장비의 동작을 정의하는 것으로 제한한다

SEMI E121 — Guide for Styleand Usage of XML for Semiconductor Manufacturing Applications

M03300 - SEMI M33 - Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total Reflection X-Ray Fluorescence Spectroscopy (TXRF) StdTpc-Substrate Carriers and Pods SEMI E10-92 (technical revision)This standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 5, 2007. It was available at www. semi. org in October 2007. Originally published September 1998. NOTICE: This document was balloted and approved for withdrawal in 2007. The test provides the analytical procedure to determine the trace level of contaminating elements of an