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semiconductor processes as reflected in a number of existing standards
Reactive gases shall not be used as they may react chemically with moisture
previously published March 2012
SEMI C92-0216 (replaced by SEMI F119)
SEMI C23-0301 (technical revision)
C00331 - SEMI C3.31 - Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 99% Quality (Provisional) Revision:SEMI C3.31-1102 - Replaced semiconductor processes as reflected inNOTICE: This document was replaced by SEMI C56 in 2005. This specification was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on August 29, 2002. Initially available at www. semi. org September 2002; to be published November 2002. Originally published in 1986; previously published in 1994. The purpose