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exceptions
This Test Method can be used for silicon in which the nitrogen content is 1 × 1014 atoms/cm3 or greater
8-0698 (Reapproved 0615)
The specification only describes information that is static in nature (i
6-0813 (Withdrawn 0822) — Specification for Round 125 mm Diameter Polished Monocrystalline Gallium Arsenide Wafers
P02100 - SEMI P21 - Guidelines for Precision and Accuracy Expression for Mask Writing Equipment Revision:SEMI P21-92 (Reapproved 0703) - Inactive exceptionsThis guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www. semi. org June 2003; to be published July 2003. Originally published in 1992. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain
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